Fd. Mota et al., STRUCTURAL AND ELECTRONIC-PROPERTIES OF SILICON-NITRIDE MATERIALS, International journal of quantum chemistry, 70(4-5), 1998, pp. 973-980
We developed an empirical potential for interactions between Si and N
to describe silicon nitride systems using the Tersoff functional form.
With this model, we explored the structural properties of amorphous s
ilicon nitride through the Monte Carlo simulations and compared them t
o available experimental data. The empirical model provided a very goo
d description of such properties for a - SiNx (0 < x < 1.5). Electroni
c structure of amorphous and point defects in crystalline silicon nitr
ide were then studied using first-principles calculations. For such ca
lculations, the configurations were created by the empirical model, wi
th the relaxed structures used as input for the first-principles calcu
lations. Atomic relaxation was later allowed in the first-principles c
alculations. (C) 1998 John Wiley & Sons, Inc.