ON THE CORRELATION BETWEEN CRYSTALLINITY OF PLATINUM BOTTOM ELECTRODEAND THAT OF MOD DERIVED PZT THIN-FILMS

Citation
Dh. Bao et al., ON THE CORRELATION BETWEEN CRYSTALLINITY OF PLATINUM BOTTOM ELECTRODEAND THAT OF MOD DERIVED PZT THIN-FILMS, Ferroelectrics. Letters section (Print), 24(3-4), 1998, pp. 97-104
Citations number
17
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
07315171
Volume
24
Issue
3-4
Year of publication
1998
Pages
97 - 104
Database
ISI
SICI code
0731-5171(1998)24:3-4<97:OTCBCO>2.0.ZU;2-6
Abstract
Growth of well (111)-oriented Pt and Pt/Ti films on SiO2/Si(111) subst rates and crystallinity of PZT films grown on the Pt(111)/SiO2/Si(111) and Pt(111)/Ti/SiO2/Si(111) substrates have been investigated. It was found by X-ray diffraction analysis that well (111)-oriented Pt film with a best full-width at half maximum (FWHM) of 0.28 degrees was grow n by the DC sputtering method. PZT films were prepared by metallo-orga nic decomposition(MOD) on Pt(111)-coated SiO2/Si(111) substrates. The crystallinity of the PZT films improved as the FWHM of the Pt(111) dif fraction peak decreased. The best FWHM obtained for a PZT film grown o n a Pt(111)/Ti/SiO2/Si(111) substrate was 0.33 degrees.