Rh. Anderson et Md. Miller, HE-3 TRANSVERSE EXCITED-STATE OCCUPATION IN THIN HE-3-HE-4 FILMS, Journal of low temperature physics, 113(3-4), 1998, pp. 311-316
The discovery that He-3 was occupying transverse excited states at sub
monolayer coverages in He-3-He-4 mixture films on a Nuclepore substrat
e, was a surprise. In this note we discuss the relationship between th
eory and experiment in attempting to understand the physics of this be
havior. We first discuss various single-atom-limit calculations of the
level spacing between the groundstate and first excited state. We the
n introduce a free, quasi-particle picture for analyzing experimental
magnetization step data and compare those results with the single-atom
-limit calculations. The experiments clearly show excited state occupa
tion at submonolayer coverages in contradistinction with the calculati
ons. We then briefly discuss a microscopic, semi-phenomenological theo
ry which, in agreement with experiment, yields He-3 occupation of the
first excited state at submonolayer coverages. The mechanism is a mode
l He-3-He-3 effective interaction due to one ripplon exchange. This ef
fective interaction is density dependent and very long ranged. It stro
ngly modifies the small-le properties of the He-3 self-energy and, in
particular, causes the ground-state to first excited state level spaci
ng to decrease with increasing He-3 areal density.