We describe a resonant cavity detector which uses epitaxial p-type SiG
e-Si quantum wells for absorption which are epitaxially grown above a
high reflectance tungsten silicide layer. The device operates in the 8
-12-mu m band in normal incidence and exhibits a x8 enhancement in its
peak photoresponse when compared to a nonresonant control device. The
black body responsivity is comparable to current n-GaAs-AlGaAs detect
ors at 1 V making it suitable for integration in a monolithic Si-based
focal plane array. Ways to optimize the device design to achieve impr
oved performance are discussed.