M. Madhav et al., IMPROVEMENTS IN FIBER ALIGNMENT TOLERANCE USING CHEMICALLY ETCHED MONOLITHICALLY INTEGRATED MICROLENSES ON INGAAS-INP PIN PHOTODETECTORS, Electronics Letters, 33(10), 1997, pp. 891-892
The monolithic integration of a microlense with an InGaAs:InP pin phot
odetector using a simple two-step wet chemical etching process is repo
rted. Using this technology, improvements in fibre alignment tolerance
s from 28 to 56 mu m were achieved for photodetectors with a 25 mu m d
iameter active area.