Synchrotron-radiation induced core-level photoemission spectroscopy (P
ES) has been used to characterise the growth of Pt:Cu(100). Decomposit
ion of the Pt 4f(7/2) photoemission lines shows, for Pt deposition up
to 2 ML, the formation during the growth process of an extended Pt-Cu
surface alloy. We estimate the Pt concentration in the surface layer t
o bz 50%. This result is consistent with the observed c(2 x 2) LEED pa
ttern. For higher coverage, the surface alloy is destroyed and a pure
and disordered Pt thin film starts to grow. Annealing of the surface a
lloy formed during the growth of the pure Pt thin film at 300 degrees
C leads to the same situation: formation of a surface alloy due to a k
inetic blocking of the dissolution. The surface composition of this su
rface alloy is Cu50Pt50. This particular behaviour of the kinetics of
dissolution has been already observed in PtCu(111).