CHARACTERISTICS OF INALAS INGAAS HIGH-ELECTRON-MOBILITY TRANSISTORS UNDER 1.3-MU-M LASER ILLUMINATION/

Citation
Y. Takanashi et al., CHARACTERISTICS OF INALAS INGAAS HIGH-ELECTRON-MOBILITY TRANSISTORS UNDER 1.3-MU-M LASER ILLUMINATION/, IEEE electron device letters, 19(12), 1998, pp. 472-474
Citations number
15
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
07413106
Volume
19
Issue
12
Year of publication
1998
Pages
472 - 474
Database
ISI
SICI code
0741-3106(1998)19:12<472:COIIHT>2.0.ZU;2-O
Abstract
The current-voltage (I-V) characteristics of InAlAs/InGaAs high electr on mobility transistors (HEMT's) under illumination are investigated. The change of the drain current caused by the illumination can be expl ained by using the photovoltaic effect so that the excess holes photo- generated in the InGaAs channel lager accumulate at the source-electro de region and cause an effective decrease in the potential barrier for electrons between the source and the channel, The basic equations des cribing this phenomenon are derived on the basis of the experimental r esults. In addition, our experimental results are shown to support the barrier-induced hole pile-up model in which holes generated by the im pact ionization accumulate in the InAlAs barrier on the source side an d cause the kink effect in InAlAs/InGaAs HEMT's.