POLYSILANES AS CONDUCTING MATERIAL PRODUCERS AND THEIR APPLICATION TOMETAL PATTERN-FORMATION BY UV-LIGHT AND ELECTROLESS METALLIZATION

Citation
M. Fukushima et al., POLYSILANES AS CONDUCTING MATERIAL PRODUCERS AND THEIR APPLICATION TOMETAL PATTERN-FORMATION BY UV-LIGHT AND ELECTROLESS METALLIZATION, Synthetic metals, 97(3), 1998, pp. 273-280
Citations number
16
Categorie Soggetti
Physics, Condensed Matter","Material Science","Polymer Sciences
Journal title
ISSN journal
03796779
Volume
97
Issue
3
Year of publication
1998
Pages
273 - 280
Database
ISI
SICI code
0379-6779(1998)97:3<273:PACMPA>2.0.ZU;2-P
Abstract
This paper describes a novel method for the deposition of gold, silver and palladium colloids on polysilane films by reducing the correspond ing metal salt dissolved in alcohol without the use of any other reduc tants, and an application of the methodology to the pattern formation of copper and nickel metal by palladium-catalyzed electroless metalliz ation on the surface of poly(methylphenylsilane) film, in combination with UV light lithography at 254 nm without the use of any other photo resists. (C) 1998 Elsevier Science S.A. All rights reserved.