M. Fukushima et al., POLYSILANES AS CONDUCTING MATERIAL PRODUCERS AND THEIR APPLICATION TOMETAL PATTERN-FORMATION BY UV-LIGHT AND ELECTROLESS METALLIZATION, Synthetic metals, 97(3), 1998, pp. 273-280
This paper describes a novel method for the deposition of gold, silver
and palladium colloids on polysilane films by reducing the correspond
ing metal salt dissolved in alcohol without the use of any other reduc
tants, and an application of the methodology to the pattern formation
of copper and nickel metal by palladium-catalyzed electroless metalliz
ation on the surface of poly(methylphenylsilane) film, in combination
with UV light lithography at 254 nm without the use of any other photo
resists. (C) 1998 Elsevier Science S.A. All rights reserved.