PROBING SILICON SUBSTITUTION IN MOLECULAR-SIEVES BY PLASMA DESORPTIONMASS-SPECTROMETRY

Citation
Mj. Vanstipdonk et al., PROBING SILICON SUBSTITUTION IN MOLECULAR-SIEVES BY PLASMA DESORPTIONMASS-SPECTROMETRY, Journal of molecular structure, 470(1-2), 1998, pp. 183-190
Citations number
23
Categorie Soggetti
Chemistry Physical
ISSN journal
00222860
Volume
470
Issue
1-2
Year of publication
1998
Pages
183 - 190
Database
ISI
SICI code
0022-2860(1998)470:1-2<183:PSSIMB>2.0.ZU;2-E
Abstract
Plasma desorption was used to produce secondary ion mass spectra from samples of unsubstituted and substituted aluminum phosphate materials. The yield of fingerprint ions representative of silicon oxide solids indicates that the incorporation of silicon into the material during s ynthesis and following calcination occurs via the formation of silicon -rich islands. Complementary Xray photoelectron data provide supportin g evidence that the surface of the substituted aluminum phosphate mate rial becomes silicon rich and phosphorus depleted. No changes in the u nsubstituted and substituted material with respect to composition and phase were detected using powder X-ray diffraction. (C) 1998 Elsevier Science B.V. All rights reserved.