Aj. Perry et al., RESIDUAL-STRESS IN CEMENTED CARBIDE FOLLOWING A COATING PROCESS AND AFTER AN ION-IMPLANTATION POSTTREATMENT OF THE COATING, Surface & coatings technology, 109(1-3), 1998, pp. 225-229
The residual stress in cemented carbide, specifically in the WC phase,
following PVD and CVD coating processes is studied together with the
effects of ion implantation post-treatment of the CVD-coated material.
Over the depth range studied, the compressive stress in the WC is una
ffected by the PVD coating process, but is changed to tensile after a
CVD TiN coating process. In contrast, a dual alumina/Ti(C,N) CVD coati
ng treatment produces a higher compressive stress in the WC. An ion im
plantation post-treatment has a beneficial effect on the tensile stres
s under CVD TiN by reducing it to near-zero or to a compressive stress
where the magnitude of the effect depends on ion implanted, coating t
hickness, and acceleration energy. The post-implantation has no effect
on the compressive stress in the alumina coating or its Ti(C,N) inter
layer. (C) 1998 Elsevier Science S.A. All rights reserved.