A. Rizzo et al., THE INFLUENCE OF ION MASS AND ENERGY ON THE COMPOSITION OF IBAD OXIDE-FILMS, Surface & coatings technology, 109(1-3), 1998, pp. 297-302
Dual ion-beam sputtering deposition is a very promising technique for
fabricating optical coatings thanks to its very good control of the de
position parameters. Unfortunately, the different sputtering yields of
the elements composing the films modify the stoichiometry and, conseq
uently, may cause an increase of the absorption in the UV range and an
undesirable variation of the refractive index. In this work we invest
igate the influence of ion-beam assistance on some oxide materials. Si
O2, ZrO2, and HfO2. The sputtering yield has been measured by varying
the mass (Ar, Xe) and energy (100-1000 eV) of the bombarding ions. The
yield measurements were compared with the calculated yields using Sig
mund's model. Different screening functions for different characterist
ic energy ranges were necessary to fit the experimental results. (C) 1
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