R. Shimizu, CHARACTERIZATION OF A REFRACTORY SURFACE AT A HIGH-TEMPERATURE APPLIED TO THE ZR-O W(100) SYSTEM - ON SELF-RECOVERY FUNCTION/, Journal of Electron Microscopy, 47(5), 1998, pp. 371-378
Surface characterization of the Zr-O/W(100) system, widely used as a h
igh stability and high brightness cathode, was performed under operati
ng conditions of (similar to 1710 K and similar to 10(-6) Pa) to bette
r understand its electron emission characteristics. The combined surfa
ce analysis techniques employed were Auger electron spectroscopy, ion
scattering spectroscopy, high energy electron diffraction, and work fu
nction measurement. This study has clarified the nature of the self-re
covery function of the Zr-O/W(100) system as follows: excess Zr-O comp
lex on the surface diffuses into the W-substrate during the initial pr
ocedure of oxygen processing. These Zr-O complexes are then available
to segregate to the surface to compensate for the deficiency of Zr ato
ms, caused by ion bombardment from residual gases at similar to 10(-6)
Pa during operation. This leads to the very high stability of the ele
ctron emissivity. A model of the self-recovery function for oxygen ads
orption is also proposed as an oxygen adsorption-deoxidization cycle a
ppearing in Zr-O/W(100) under the operating conditions.