Xy. Zhang et Yl. Du, ELECTROCHEMICAL-BEHAVIOR OF CU UNDERNEATH THIN ELECTROLYTE FILM IN ATMOSPHERE, JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY, 14(6), 1998, pp. 547-550
Citations number
7
Categorie Soggetti
Material Science","Metallurgy & Metallurigical Engineering
An electrochemical cell was devised to investigate corrosion electroch
emical behavior of metal underneath thin electrolyte film in atmospher
e. The Piontelli's type of Luggin-Haber capillary was inserted from th
e backward of working electrode. The results show that. cathodic proce
ss on Cu is mainly affected by the thickness of the electrolyte film o
f 0.5 mol/L HCl+1 mol/LNa2SO4 aqueous solution and its anodic dissolut
ion changed from Tafel region to limiting diffusion current. Moreover,
the corrosion potential of Cu in due media will increase with decreas
e of the thickness of the film.