STABILITY OF C70FX CRYSTALLINE UNDER HIGH-PRESSURE

Citation
S. Kawasaki et al., STABILITY OF C70FX CRYSTALLINE UNDER HIGH-PRESSURE, Solid state communications, 108(10), 1998, pp. 749-752
Citations number
15
Categorie Soggetti
Physics, Condensed Matter
Journal title
ISSN journal
00381098
Volume
108
Issue
10
Year of publication
1998
Pages
749 - 752
Database
ISI
SICI code
0038-1098(1998)108:10<749:SOCCUH>2.0.ZU;2-K
Abstract
In order to study the stability range of C70Fx under high pressure at room temperature, in situ X-ray diffraction experiments were performed under pressures up to 6.7 GPa. It was found that C70Fx transforms fro m a crystalline to an amorphous phase at about 5.5 GPa. The pressure-v olume relation of C70Fx was also investigated. The bulk modulus and it s pressure derivative were determined to be 26.6 (1.8) GPa and 3.0 (0. 7), respectively. (C) 1998 Elsevier Science Ltd. All rights reserved.