M. Takeda et al., MICROSTRUCTURE AND OXIDATIVE-DEGRADATION BEHAVIOR OF SILICON-CARBIDE FIBER HI-NICALON TYPE-S, Journal of nuclear materials, 263, 1998, pp. 1594-1599
Citations number
13
Categorie Soggetti
Nuclear Sciences & Tecnology","Mining & Mineral Processing","Material Science
Polycarbosilane-derived SiC fibers. Nicalon, Hi-Nicalon, and Hi-Nicalo
n type S were exposed for 1 to 100 h at 1273-1773 K in air. Oxide laye
r growth and tensile strength change of these fibers were examined aft
er the oxidation test. As a result, three types of SIC fibers decrease
d their strength as oxide layer thickness increased. Fracture origins
were determined at near the oxide layer-fiber interface. Adhered fiber
s arised from softening of silicon oxide at high temperature were also
observed. In this study, Hi-Nicalon type S showed better oxidation re
sistance than other polycarbosilane-derived SIC fibers after 1673 K or
higher temperature exposure in air for 10 h. This result was explaine
d by the poreless silicon oxide layer structure of Hi-Nicalon type S.
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