O. Okada et al., EFFECTS OF MA AND SI ADDITIONS ON MICROSTRUCTURAL DEVELOPMENT IN TIALINTERMETALLIC COMPOUNDS IRRADIATED WITH HE-IONS, Journal of nuclear materials, 263, 1998, pp. 1750-1755
Citations number
14
Categorie Soggetti
Nuclear Sciences & Tecnology","Mining & Mineral Processing","Material Science
A Ti-47 at.% Al intermetallic alloy and three TiAl alloys containing s
imilar to 2.0 at.% Mn and/or similar to 0.4 at.% Si were prepared by p
owder metallurgical processing. When the samples were irradiated with
Ne-ions to 3 dpa at 773 K, formation : of defect clusters and cavities
in TiAl alloys were remarkably suppressed by the addition of Mn. In M
n-added TiAl, although no loops, which were observed in pure TiAl and
Si-added samples, were formed, the defect clusters with large strain f
ield were found. It was suggested that the defect clusters were formed
by the migration of mixed dumbbell type Mn atom-interstitials. The ad
dition of Si showed no beneficial effects on suppression of radiation
damage in TiAl alloys. (C) 1998 Elsevier Science B.V. All rights reser
ved.