PREPARATION OF AZOBENZENE-MICA COMPLEX AND ITS PHOTORESPONSE TO ULTRAVIOLET-IRRADIATION

A novel vapor phase intercalation method was applied to the preparatio n of complexes of azobenzene and synthetic tetra-silicic mica in order to obtain photoresponsive solids. Photoresponse was monitored by meas uring the basal spacing, d(001). The basal spacing of the complex obta ined was found to decrease by 4% after 1 h of ultraviolet (UV) irradia tion (lambda = 365 nm). The initial basal spacing was recovered after storage for 2 days at room temperature and following 1 h of heat treat ment at 50 degrees C. Such a reversible basal spacing change was obser ved after more than 15 successive cycles. The photoresponsive change w as attributed to the isomerization of incorporated azobenzene molecule s. (C) 1998 Elsevier Science Ltd.