EFFECT OF THE HYDROGEN ON THE INTRINSIC STRESS IN HYDROGENATED AMORPHOUS-CARBON FILMS DEPOSITED FROM AN ELECTRON-CYCLOTRON-RESONANCE PLASMA

The intrinsic stresses have been investigated in detail in particular diamondlike carbon films prepared by chemical vapor deposition assiste d by electron cyclotron resonance plasma, as a function of the substra te bias and sample thickness in relation with the H content and bondin g. Combined infrared absorption, elastic recoil detection analysis, an d residual stress measurements are used to fully characterize the film s in their as deposited state. The results indicate clearly that both the low and high biased samples exhibit compressive stresses. The stre sses are found to be higher in the high biased films and are affected not only by the [H]/[C] ratio but also by the C-H and C-C volumetric d istortions. [S0003-6951(98)04048-0]. (C) 1998 American Institute of Ph ysics.