G. Meneghesso et al., HOT-CARRIER EFFECTS IN ALGAAS INGAAS HIGH-ELECTRON-MOBILITY TRANSISTORS - FAILURE MECHANISMS INDUCED BY HOT-CARRIER TESTING/, Journal of applied physics, 82(11), 1997, pp. 5547-5554
A new failure mechanism of AlGaAs/InGaAs pseudomorphic high electron m
obility transistors has been observed after hot carrier de accelerated
testing. Hot carrier effects have been characterized by means of gate
current measurements and electroluminescence spectroscopy. After acce
lerated testing, a permanent degradation has been found, consisting of
the decrease of drain current I-D, and of the absolute value of the p
inch-off voltage V-p, at low drain-source voltage V-DS, resulting in t
he development of a remarkable ''kink'' in the output characteristics.
Direct current, pulsed, and low-frequency ac measurements demonstrate
that the failure mechanism consists of the creation of deep levels un
der the gate which act as electron traps at low gate-to-drain electric
fields. Deep level transient spectroscopy and photoinjection measurem
ents reveal the presence of two levels at 0.77 eV and 1.22 eV. The int
ensity of the 1.22 eV peak is correlated with the degradation observed
in stressed devices. (C) 1997 American Institute of Physics.