A very sensitive dielectric resonator technique is employed to measure
loss tangent tan delta and relative permittivity epsilon(r) of lantha
num aluminate (LaAlO3) single crystals at 4-300 K and 4-12 GHz. A vari
ety of single crystals grown by different techniques and purchased fro
m different suppliers are considered. For T > 150 K the loss tangent t
an Sis almost sample independent with Linear frequency dependence and
monotonous temperature variation from 8 x 10(-6) at 300 K to 2.5 x 10(
-6) at 150 K and 4.1 GHz. In this temperature range the experimental d
ata are explained by a model based on lifetime broadened two-phonon di
fference processes. The loss tangent below 150 K is characterized by a
peak in tan delta(T) at about 70 K. The height of this peak is freque
ncy and strongly sample dependent. This leads to a variation of the lo
ss tangent from 10(-6) to 1.5 x 10(-5) at 77 K and 8.6 GHz, the lowest
values are generally achieved with Verneuil grown crystals and approa
ch the intrinsic lower limit predicted by the phonon model. The peak i
s explained by defect dipole relaxation (local motions of ions). The a
ctivation energy of the relaxation process is determined from the meas
ured data to be 31 meV. This low value indicates that the defect dipol
es are associated with interstitials, possibly impurities in interstit
ial positions. Considering absorption due to phonons and due to defect
dipole relaxation the loss tangent is calculated for a wide frequency
range. (C) 1997 American Institute of Physics.