Plasma immersion ion implantation (PI3) is a new hybrid technology usi
ng elements of ion implantation as well as plasma nitriding. In additi
on, and due to the high energetic ion bombardment, thermal diffusion c
an be used to obtain thicker layers than in conventional ion implantat
ion. Furthermore, the process can be used in an ion beam enchanced dep
osition (IBED) mode to produce various kinds of coatings. This enables
the treatment to be adapted to the material structure and state and a
lso to the intended service conditions. Furthermore, economic aspects
make PI3 an interesting technique for surface modification of a wide r
ange of materials. An overview of the worldwide activities in the trea
tment of components and the achieved improvements will be given. (C) 1
997 Elsevier Science S.A.