ULTRA-PRECISION POLISHING CMP TECHNOLOGY IN FABRICATION PROCESS OF NEXT-GENERATION SEMICONDUCTORS AND ITS APPLICATION

Authors
DOY TK
Citation
Tk. Doy, ULTRA-PRECISION POLISHING CMP TECHNOLOGY IN FABRICATION PROCESS OF NEXT-GENERATION SEMICONDUCTORS AND ITS APPLICATION, Toraiborojisuto, 42(10), 1997, pp. 755-761
Citations number
9
Journal title
Toraiborojisuto → ACNP
ISSN journal
09151168
Volume
42
Issue
10
Year of publication
1997
Pages
755 - 761
Database
ISI
SICI code
0915-1168(1997)42:10<755:UPCTIF>2.0.ZU;2-V