Wc. Wei et al., DETERMINATION OF BORON USING MANNITOL-ASSISTED ELECTROTHERMAL VAPORIZATION FOR SAMPLE INTRODUCTION IN INDUCTIVELY-COUPLED PLASMA-MASS SPECTROMETRY, Journal of analytical atomic spectrometry, 10(11), 1995, pp. 955-961
The possibility of improving the detection sensitivity for boron with
the use of mannitol as a chemical modifier in electrothermal vaporizat
ion inductively coupled plasma mass spectrometry (ETV-ICP-MS) is prese
nted. Experiments were performed by adding mannitol to a boron analyte
solution to form a boron-mannitol complex and then injecting the resu
lting product into the ETV-ICP-MS system for determination, The effect
of mannitol on the signal pulse of boron was investigated by monitori
ng the analyte through a heating cycle from 150 to 2600 degrees C, The
appearance of several marked signal pulses at temperatures between 42
5 and 1500 degrees C was observed and assumed to result from the vapor
ization of boron-mannitol complexes. The signal intensity of boron in
the presence of mannitol was found to be considerably enhanced in comp
arison with that in its absence, The optimization of the ETV and ICP p
arameters and the amount of mannitol added and the comparison of manni
tol with different modifier systems mere subsequently investigated. It
was found that by following the established method the sensitivity fo
r boron in the presence of mannitol can be improved by a factor of 84
compared with that without the modifier, and the limits of detection (
3 s) achieved in the presence of mannitol can be as low as 0.2 ng ml(-
1) with a 20 mu l injection. The large boron sensitivity enhancement i
n the presence of mannitol in ETV-ICP-MS is attributed to the formatio
n of a boron-mannitol complex that is subsequently vaporized from the
graphite surface and transported with the assistance of mannitol to th
e plasma. A novel application with mannitol, which acts both as a prec
oncentrating agent for boron in the chemical separation process and as
a modifier in the ETV-ICP-MS for the determination of boron in trichl
orosilane, is also presented.