Calibration of a computer-controlled precision wavemeter for use with pulsed lasers

Citation
Ps. Bhatia et al., Calibration of a computer-controlled precision wavemeter for use with pulsed lasers, APPL OPTICS, 38(12), 1999, pp. 2486-2498
Citations number
41
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Optics & Acoustics
Journal title
APPLIED OPTICS
ISSN journal
00036935 → ACNP
Volume
38
Issue
12
Year of publication
1999
Pages
2486 - 2498
Database
ISI
SICI code
0003-6935(19990420)38:12<2486:COACPW>2.0.ZU;2-R
Abstract
The design of a pulsed wavemeter to monitor the high-precision tuning of pu lsed (as well as cw) laser sources is presented. This device is developed f rom a combination of silver-coated Fabry-Perot etalons with various plate s pacings. These etalons provide stepwise refinement of the wavelength to be measured. The wavemeter is controlled by a computer through a CAMAC interfa ce, which measures the absolute wavelength in the visible with an accuracy of 2 parts in 10(8). The time required for data acquisition and computation to measure the refined wavelength with a single 2-MHz CPU is less than 100 ms. We describe the calibration of the instrument over the wavelength rang e 400-850 nm. We obtain the required calibration lines by locking lasers on hyperfine transitions of iodine, uranium, rubidium, and cesium. Methods to reduce the number of calibration lines required for calibration of the sys tem are described. The expected wavelength-dependent phase shift of the sil ver coatings is compared with that measured for the etalon following calibr ation. The differences are larger than expected because of either optical a berations or the use of centroids to measure the fringe position. (C) 1999 Optical Society of America.