Fabrication of high-quality one- and two-dimensional electron gases in undoped GaAs/AlGaAs heterostructures

Citation
Rh. Harrell et al., Fabrication of high-quality one- and two-dimensional electron gases in undoped GaAs/AlGaAs heterostructures, APPL PHYS L, 74(16), 1999, pp. 2328-2330
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
74
Issue
16
Year of publication
1999
Pages
2328 - 2330
Database
ISI
SICI code
0003-6951(19990419)74:16<2328:FOHOAT>2.0.ZU;2-B
Abstract
We have developed a technique for the fabrication of high-mobility electron gases formed in undoped GaAs/AlGaAs heterostructures. The use of an insula ted gate allows independent control over the carrier density in the Hall ba r and ohmic contact regions of the device. This unique design eliminates di fficulties in obtaining reliable ohmic contacts, particularly in the low ca rrier density regime. In the absence of remote ionized impurity scattering, extremely high transport mobilities are obtained at low carrier densities (1 x 10(6) cm(2) V-1 s(-1) at 1 x 10(10) cm(-2)). This design has been adap ted to the formation of undoped one-dimensional electron gases that show cl ean and reproducible conductance plateau at 1.5 K. (C) 1999 American Instit ute of Physics. [S0003-6951(99)2216-0].