Ks. Yoo et al., Electrodes of nitrogen-incorporated tetrahedral amorphous carbon - A novelthin-film electrocatalytic material with diamond-like stability, EL SOLID ST, 2(5), 1999, pp. 233-235
Electrodes of conductive nitrogen-incorporated tetrahedral amorphous carbon
films (taC:N) deposited at ambient temperatures are shown to possess an ex
traordinary combination of the stability associated with boron-doped diamon
ds and greatly enhanced electrocatalytic properties. In this first communic
ation on the electrochemistry of deposited thin films of taC:N, we show tha
t this material demonstrates more active charge transfer properties on a va
riety of systems relative to the H-terminated, highly boron-doped diamond (
B-diamond). Stability is shown by chlorine evolution from HCl solution for
>10(4) times the coulombs necessary for 4e/C-atom oxidation to CO2 of a 40
nm thick taC:N film without noticeable change of the voltammetry. Propitiou
s attributes result from the high nitrogen content coupled with the sp(2)/s
p(3) mixed character of the amorphous semiconductor, which can be deposited
at room temperature on practically any substrate. (C) 1999 The Electrochem
ical Society. S1099-0062(99)01-030-5. All rights reserved.