Electrodes of nitrogen-incorporated tetrahedral amorphous carbon - A novelthin-film electrocatalytic material with diamond-like stability

Citation
Ks. Yoo et al., Electrodes of nitrogen-incorporated tetrahedral amorphous carbon - A novelthin-film electrocatalytic material with diamond-like stability, EL SOLID ST, 2(5), 1999, pp. 233-235
Citations number
17
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
ELECTROCHEMICAL AND SOLID STATE LETTERS
ISSN journal
10990062 → ACNP
Volume
2
Issue
5
Year of publication
1999
Pages
233 - 235
Database
ISI
SICI code
1099-0062(199905)2:5<233:EONTAC>2.0.ZU;2-X
Abstract
Electrodes of conductive nitrogen-incorporated tetrahedral amorphous carbon films (taC:N) deposited at ambient temperatures are shown to possess an ex traordinary combination of the stability associated with boron-doped diamon ds and greatly enhanced electrocatalytic properties. In this first communic ation on the electrochemistry of deposited thin films of taC:N, we show tha t this material demonstrates more active charge transfer properties on a va riety of systems relative to the H-terminated, highly boron-doped diamond ( B-diamond). Stability is shown by chlorine evolution from HCl solution for >10(4) times the coulombs necessary for 4e/C-atom oxidation to CO2 of a 40 nm thick taC:N film without noticeable change of the voltammetry. Propitiou s attributes result from the high nitrogen content coupled with the sp(2)/s p(3) mixed character of the amorphous semiconductor, which can be deposited at room temperature on practically any substrate. (C) 1999 The Electrochem ical Society. S1099-0062(99)01-030-5. All rights reserved.