Nonlinear resistance of polycrystalline boron-doped diamond films

Citation
N. Vinokur et al., Nonlinear resistance of polycrystalline boron-doped diamond films, EL SOLID ST, 1(6), 1998, pp. 265-267
Citations number
14
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
ELECTROCHEMICAL AND SOLID STATE LETTERS
ISSN journal
10990062 → ACNP
Volume
1
Issue
6
Year of publication
1998
Pages
265 - 267
Database
ISI
SICI code
1099-0062(199812)1:6<265:NROPBD>2.0.ZU;2-C
Abstract
The i-V characteristics for B-doped diamond (BDD) films on Si and quartz ex hibit linear and nonlinear features from four-point probe measurements at v arying currents depending on boron doping. Films with boron concentrations >10(19) cm(-3) have linear characteristics; those with <10(19) cm(-3) have correspondingly increasing nonlinear symmetrical resistance. The value of r esistance extrapolated to zero current is consistent with the literature va lues for BDD films on quartz. The diamond films on Si have lower resistance by leakage through the Si substrate, but also show the nonlinear effect. S uch symmetrical nonlinearity can be explained by potential barriers forming at the grain-grain interfaces, which strongly suppress the flow of majorit y carriers. (C) 1998 The Electrochemical Society. S1099-0062(98)06-109-4. A ll rights reserved.