The i-V characteristics for B-doped diamond (BDD) films on Si and quartz ex
hibit linear and nonlinear features from four-point probe measurements at v
arying currents depending on boron doping. Films with boron concentrations
>10(19) cm(-3) have linear characteristics; those with <10(19) cm(-3) have
correspondingly increasing nonlinear symmetrical resistance. The value of r
esistance extrapolated to zero current is consistent with the literature va
lues for BDD films on quartz. The diamond films on Si have lower resistance
by leakage through the Si substrate, but also show the nonlinear effect. S
uch symmetrical nonlinearity can be explained by potential barriers forming
at the grain-grain interfaces, which strongly suppress the flow of majorit
y carriers. (C) 1998 The Electrochemical Society. S1099-0062(98)06-109-4. A
ll rights reserved.