Micro-Raman study of free-standing porous silicon samples

Citation
S. Trusso et al., Micro-Raman study of free-standing porous silicon samples, J VAC SCI B, 17(2), 1999, pp. 468-473
Citations number
27
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
17
Issue
2
Year of publication
1999
Pages
468 - 473
Database
ISI
SICI code
1071-1023(199903/04)17:2<468:MSOFPS>2.0.ZU;2-C
Abstract
Micro-Raman spectroscopy has been employed for the characterization of a se t of free-standing porous silicon samples with different degrees of porosit y, fabricated by electrical anodization of n(+) Si wafers. A broadening and a shift toward lower energy of the transverse optical silicon phonon mode have been clearly observed, indicating the presence of nanometer-sized crys talline structures. In particular, higher porosity samples reveal an inhomo geneous structure characterized by a spread of the nanocrystal size as a fu nction of the region under investigation. The photoluminescence properties of samples produced with similar fabrication parameters, displaying both a blue and a red band, seem to be in agreement with the nanocrystal dimension s derived through micro-Raman spectroscopy. (C) 1999 American Vacuum Societ y. [S0734-211X(99)07102-4].