Bp. Wang et al., Fabrication and characteristics of an emitter-sharpened double-gate racetrack-shaped field emitter structure, J VAC SCI B, 17(2), 1999, pp. 570-574
In this article, numerical and experimental characterizations of an emitter
-sharpened double-gate racetrack-shaped field emitter structure are reporte
d. The racetrack-shaped edge emission with double-gate control is used to p
rovide good uniformity, large field emission current density, and small tur
n-on voltage. In order to improve the performance of this structure further
; an emitter-sharpened structure is used to minimize gate current. Experime
ntal results show that the gate current of the emitter-sharpened double-gat
e structure is 7 times and 15 times smaller than that of the nonemitter-sha
rpened double-gate structure and the single-gate structure, respectively. S
imulated results also show that the gate current of the emitter-sharpened d
ouble-gate structure can almost be eliminated. (C) 1999 American Vacuum Soc
iety. [S0734-211X(99)03202-3].