Fabrication and characteristics of an emitter-sharpened double-gate racetrack-shaped field emitter structure

Citation
Bp. Wang et al., Fabrication and characteristics of an emitter-sharpened double-gate racetrack-shaped field emitter structure, J VAC SCI B, 17(2), 1999, pp. 570-574
Citations number
4
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
17
Issue
2
Year of publication
1999
Pages
570 - 574
Database
ISI
SICI code
1071-1023(199903/04)17:2<570:FACOAE>2.0.ZU;2-8
Abstract
In this article, numerical and experimental characterizations of an emitter -sharpened double-gate racetrack-shaped field emitter structure are reporte d. The racetrack-shaped edge emission with double-gate control is used to p rovide good uniformity, large field emission current density, and small tur n-on voltage. In order to improve the performance of this structure further ; an emitter-sharpened structure is used to minimize gate current. Experime ntal results show that the gate current of the emitter-sharpened double-gat e structure is 7 times and 15 times smaller than that of the nonemitter-sha rpened double-gate structure and the single-gate structure, respectively. S imulated results also show that the gate current of the emitter-sharpened d ouble-gate structure can almost be eliminated. (C) 1999 American Vacuum Soc iety. [S0734-211X(99)03202-3].