Nonlithographic technique for the production of large area high density gridded field emission sources

Authors
Holland, ER Harrison, MT Huang, M Wilshaw, PR
Citation
Er. Holland et al., Nonlithographic technique for the production of large area high density gridded field emission sources, J VAC SCI B, 17(2), 1999, pp. 580-582
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
17
Issue
2
Year of publication
1999
Pages
580 - 582
Database
ISI
SICI code
1071-1023(199903/04)17:2<580:NTFTPO>2.0.ZU;2-P
Abstract
We report a novel method for the production of high density arrays of gridd ed microtip field emission electron sources. The microporous structure of A l2O3, formed by anodization of aluminum, is exploited to provide a high den sity (5 x 10(8) cm(-2)) of sites for:emitter fabrication without the need f or individual lithographic patterning of each emitter. The small size of th e resultant emitters enables operation with only moderate extraction voltag e (20-50 V). Tests of groups of approximate to 200000 emitters have demonst rated emission current densities suitable for display applications. (C) 199 9 American Vacuum Society. [S0734-211X(99)00102-X].