Ss. Proffitt et al., Field emission from thin film diamond grown using a magnetically enhanced radio frequency plasma source, J VAC SCI B, 17(2), 1999, pp. 719-722
Nanocrystalline diamond films have been prepared using a novel magnetically
enhanced radio frequency assisted plasma chemical vapor deposition source.
Such films show field emission at applied fields below 10 V/mu m(-1). Simi
lar results are obtained using methane-hydrogen and methane-nitrogen gas mi
xtures, suggesting that the nitrogen promoted enhancement in field emission
that has been observed in high quality diamond films does not occur for na
nocrystalline layers. The design of the source used is easily scaled up for
large area deposition, suggesting this could be a useful approach for the
preparation of nanocrystalline diamond films for practical field emission p
urposes. (C) 1999 American Vacuum Society. [S0734-211X(99)12502-2].