The two general specifications required for plasma-based ion implantation a
re low pressure, large size plasmas and high voltage high current pulse gen
erators. In addition, pulses with rise and fall times of the order of the i
nverse ion plasma frequency and with much longer durations than those of th
e inverse ion plasma frequency are most often required, To fulfill these re
quirements, a new type of high voltage generator using a pulse transformer
has been developed. A "mettglass"(R) magnetic core is used as step-up pulse
transformer. Voltage at the primary is provided by transistor switches whi
ch can achieve rise and fall times of less than 1 mu s and maximum pulse cu
rrents of 100 A. The primary of the transformer consists of 96 turns wired
in parallel and the secondary of 96 turns wired in series. The performances
reported with this pulse generator were obtained on a test resistor and th
en on a substrate immersed in a plasma. (C) 1999 American Vacuum Society. [
S0734-211X(99)02402-6].