Arresting ultraviolet-laser damage in fused silica

Citation
F. Dahmani et al., Arresting ultraviolet-laser damage in fused silica, OPTICS LETT, 24(8), 1999, pp. 516-518
Citations number
5
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Optics & Acoustics
Journal title
OPTICS LETTERS
ISSN journal
01469592 → ACNP
Volume
24
Issue
8
Year of publication
1999
Pages
516 - 518
Database
ISI
SICI code
0146-9592(19990415)24:8<516:AUDIFS>2.0.ZU;2-X
Abstract
The 351-nm laser-damage initiation threshold for surface damage in conventi onally polished fused silica is demonstrated to be stress dependent. By cir cumferential application of modest loads to a sample, a controllable stress field can be established within the clear aperture of a fused-silica speci men, in response to which both the damage-initiation fluence and the crack- propagation fluence requirements are increased above those for unstressed c onditions. (C) 1999 Optical Society of America.