Effect of repeated Ar+ bombardment on structure and properties of PCVD thin films

Authors
Xie, F Yuan, JW Xu, KW He, JW
Citation
F. Xie et al., Effect of repeated Ar+ bombardment on structure and properties of PCVD thin films, SURF COAT, 112(1-3), 1999, pp. 236-239
Citations number
8
Categorie Soggetti
Material Science & Engineering
Journal title
SURFACE & COATINGS TECHNOLOGY
ISSN journal
02578972 → ACNP
Volume
112
Issue
1-3
Year of publication
1999
Pages
236 - 239
Database
ISI
SICI code
0257-8972(199902)112:1-3<236:EORABO>2.0.ZU;2-S
Abstract
The structure and properties of conventional d.c. PCVD TiN films and repeat ed Ar+ bombardment-PCVD TIN films have been investigated. Compared with the conventional PCVD TIN films, the repeated Ar+ bombardment-PCVD TiN films e xhibit a fine and dense structure, whereas the residual chlorine content in the films is significantly reduced. The hardness and wear resistance are i ncreased, but the bonding strength between the film and substrate shows lit tle difference in comparison with that of conventional processed coatings w ithout repeated bombarding. (C) 1999 Elsevier Science S.A. All rights reser ved.