Surface modification on 304 SS by plasma-immersed ion implantation to improve the adherence of a CVD diamond film

The weak adherence of chemical vapor deposited (CVD) diamond films on steel substrates is an important factor that limits the technological applicatio ns of these materials. We are interested in enhancing the film-to-substrate adherence by using substrate surfaces with a previous modification by plas ma-immersed ion implantation (PIII). In this work we present and discuss th e preliminary results on phase formation, microstructure and adherence eval uations. CVD diamond films were deposited on 304 SS, the surface of which w as modified by implanted carbon ions. The samples were first submitted to i mplantation with 30 keV carbon ions at different doses. Later, these surfac es were examined by Auger spectroscopy (SAM), scanning electron microscopy (SEM) and X-ray diffraction. We observed a metastable carbide phase formed from carbon and iron, which is considered to be a good polycrystalline mate rial for the nucleation of CVD diamond crystals. The CVD diamond nucleation and film growth were observed by SEM and Raman spectroscopy. These results are discussed with the emphasis on the carbon diffusion barrier on the sub strate surfaces. The preliminary results of diamond growth were encouraging . (C) 1999 Elsevier Science S.A. All rights reserved.