Thermal poling of silica in air and under vacuum: The influence of charge transport on second harmonic generation

Citation
V. Pruneri et al., Thermal poling of silica in air and under vacuum: The influence of charge transport on second harmonic generation, APPL PHYS L, 74(17), 1999, pp. 2423-2425
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
74
Issue
17
Year of publication
1999
Pages
2423 - 2425
Database
ISI
SICI code
0003-6951(19990426)74:17<2423:TPOSIA>2.0.ZU;2-X
Abstract
A comparison between thermal poling of silica in air and in vacuum is repor ted. It is shown that the second-order susceptibility and thickness of the nonlinear layer as well as their time evolution are highly dependent on the surrounding poling atmosphere. In the vacuum case a charge distribution (u nder the anode) more complex and broader than that for the air case has als o been revealed by laser induced pressure pulse measurements. A multiple ch arge carrier model can explain the formation and evolution of the depletion region under the anode. The findings are relevant to achieve improved nonl inearities in fiber and waveguide devices. (C) 1999 American Institute of P hysics. [S0003-6951(99)03617-7].