We have fabricated vertical-cavity surface-emitting lasers (VCSEL's) which,
for the first time, effectively combine a shallow ion implanted aperture,
for current confinement under a thin highly conducting lateral current inje
ction layer, and an independent index guide for optical beam confinement (I
-2-VCSEL's), Both features are possible only because they are made before a
top dielectric mirror is deposited and patterned, and are photolithographi
cally defined for improved size reproducibility compared to oxide-confined
designs. The devices emit near 980 ma and have optical power outputs of 1 m
W at 2.5-mA input, The I-2-VCSEL design also easily incorporates coplanar c
ontacts allowing us to operate flip-chip bonded I-2-VCSEL's on silicon test
chips at data rates of nearly I Gb/s.