Configuration of dislocations in lateral overgrowth GaN films

Citation
M. Hao et al., Configuration of dislocations in lateral overgrowth GaN films, J APPL PHYS, 85(9), 1999, pp. 6497-6501
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
85
Issue
9
Year of publication
1999
Pages
6497 - 6501
Database
ISI
SICI code
0021-8979(19990501)85:9<6497:CODILO>2.0.ZU;2-R
Abstract
The dislocation distribution and emission profile of sublimation lateral ov ergrowth GaN and metalorganic chemical vapor deposition films have been stu died using transmission electron microscopy and cathodoluminescence. A clos e relationship between the emission profile and the dislocation distributio n has been observed. The results show that the dislocations not only affect the band edge emission, but also the yellow emission. It is observed that the dislocations propagate laterally in the overgrowth region. The mechanis m of the change in the propagation direction of dislocations has been discu ssed. (C) 1999 American Institute of Physics. [S0021-8979(99)06309-4].