Aberrations and allowances for errors in a hemisphere solid immersion lensfor submicron-resolution photoluminescence microscopy

Authors
Baba, M Sasaki, T Yoshita, M Akiyama, H
Citation
M. Baba et al., Aberrations and allowances for errors in a hemisphere solid immersion lensfor submicron-resolution photoluminescence microscopy, J APPL PHYS, 85(9), 1999, pp. 6923-6925
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
85
Issue
9
Year of publication
1999
Pages
6923 - 6925
Database
ISI
SICI code
0021-8979(19990501)85:9<6923:AAAFEI>2.0.ZU;2-H
Abstract
We have analyzed the aberrations and allowances for an aspheric error, a th ickness error, and an air gap in a hemisphere solid immersion lens for phot oluminescence microscopy with submicron resolution beyond the diffraction l imit, where light with large ray angle and the effect of an evanescent fiel d play important roles. (C) 1999 American Institute of Physics. [S0021-8979 (99)06209-X].