Geometrically induced giant magnetoresistance behavior in quarter-micrometer strip pattern

Citation
K. Matsuyama et al., Geometrically induced giant magnetoresistance behavior in quarter-micrometer strip pattern, J APPL PHYS, 85(8), 1999, pp. 5474-5476
Citations number
5
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
85
Issue
8
Year of publication
1999
Part
2B
Pages
5474 - 5476
Database
ISI
SICI code
0021-8979(19990415)85:8<5474:GIGMBI>2.0.ZU;2-Q
Abstract
The present article reports a geometrically induced magnetoresistance (MR) behavior observed in magnetic strips consisting of a symmetric layer struct ure with lateral sizes down to 0.2 mu m. The MR ratio was markedly improved from 2.8% for an as-grown film of Co(6 nm)/Cu(6 nm)/Co(6 nm) to 4.6% by st ructuring it into a strip with 0.3 mu m width. The parabolic MR behavior ob served in the hard-axis direction suggests that the magnetization in the tw o magnetic layers rotates toward the opposite directions, which can be expl ained by the magnetostatic interaction between the surface magnetic charges at the pattern edges. The dependence of MR saturation field on the pattern width agrees well with a theoretical prediction based on a coherent rotati on model. The MR ratio was markedly increased by the increase of the layer number and the thickness of the magnetic layer, the highest value of 7.8% w as obtained for a strip made of [Co(6 nm)/Cu(4 nm)](2) Co(6 nm). A linear- and hysteresis-free MR response was performed with an alternative field mod ulation under a transverse bias field. (C) 1999 American Institute of Physi cs. [S0021-8979(99)63008-0].