Soft-solution process of Fe-Tb-O films for use in high frequency micromagnetic devices

An attempt for fabricating Fe-Tb-O films with heterogranular structures was made using a soft-solution process with an alternative current for deposit ion. The resultant film composition was found to be sensitive to the concen tration of complex agent, KNaC4H4O6, the intensity i, and the frequency f o f deposition current. These dependencies are well explained from the model for film formation. When KNaC4H4O6 = 283.47 mM, i = 6.7 mA/cm(2), and f = 6 mHz, the film with very high Tb content exceeding 29 at. % were obtained, which exhibited a relatively soft magnetic magnetization of H-c = 29 Oe and M-r/M-s = 0.93. (C) 1999 American Institute of Physics. [S0021-8979(99)777 08-X].