Giant positive magnetoresistance of Bi nanowire arrays in high magnetic fields

Citation
Km. Hong et al., Giant positive magnetoresistance of Bi nanowire arrays in high magnetic fields, J APPL PHYS, 85(8), 1999, pp. 6184-6186
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
85
Issue
8
Year of publication
1999
Part
2B
Pages
6184 - 6186
Database
ISI
SICI code
0021-8979(19990415)85:8<6184:GPMOBN>2.0.ZU;2-C
Abstract
We have studied the magnetoresistance of electrodeposited Bi wires with dia meters between 200 nm and 2 mu m in magnetic fields up to B = 55 T. In zero field, the resistance increases with decreasing temperature, indicating th at the mean free path is strongly influenced by the nanowire geometry. The high-field magnetoresistance shows strong dependence on field orientation; typically 200% for B parallel to the wires, and 600%-800% for B perpendicul ar to the wires. The perpendicular magnetoresistance is well described by a modified two-current model which suggests that the high-field response of the arrays is fairly insensitive to the wire diameter, and is dominated by bulk properties of Bi. (C) 1999 American Institute of Physics. [S0021-8979( 99)69908-X].