Uniaxial magnetic anisotropy of amorphous Fe-B films deposited electrochemically in a magnetic field

Citation
N. Fujita et al., Uniaxial magnetic anisotropy of amorphous Fe-B films deposited electrochemically in a magnetic field, J APPL PHYS, 85(8), 1999, pp. 4503-4505
Citations number
5
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
85
Issue
8
Year of publication
1999
Part
2A
Pages
4503 - 4505
Database
ISI
SICI code
0021-8979(19990415)85:8<4503:UMAOAF>2.0.ZU;2-Y
Abstract
To attempt the formation of induced uniaxial magnetic anisotropy of electro deposited amorphous Fe-B (a-Fe-B) films, a direct current magnetic field wa s applied in the film plane during deposition. The easy axis of the uniaxia l anisotropy was parallel to the direction of the applied magnetic field. I t was found that the magnitude of the applied magnetic field necessary for the formation of induced uniaxial anisotropy is as small as 10 Oe. The comp osition, deposition rate, and coercivity of the films were found to be inde pendent of the magnitude of the applied magnetic field. From scanning elect ron microscopy and atomic force microscopy micrographs, no topological chan ge of the film surface due to the application of a magnetic field was obser ved, indicating that the anisotropy rises from a microscopic origin such as atom pair ordering as in vacuum evaporated or sputtered amorphous Fe-B fil ms. (C) 1999 American Institute of Physics. [S0021-8979(99)41508-7].