In-plane fourfold and uniaxial magnetic anisotropies were studied in Fe fil
ms epitaxially grown on vicinal Ag(001) and Au(001) surfaces, which were pr
epared by molecular beam epitaxy on miscut GaAs(001) substrates. The effect
ive fourfold and uniaxial anisotropy constants, K-1(eff) and K-u(eff), whic
h are determined from magnetisation curves measured with the magneto-optic
Kerr effect, are linear functions of the inverse Fe layer thickness. The fo
urfold anisotropy shows a rotation of the easy and hard axes by 45 degrees
below a critical thickness of 6-7 ML. The uniaxial term is mainly an interf
ace contribution. We find that the orientation of the uniaxial easy axis de
pends on the Fe thickness. In thinner films (t(Fe) less than or equal to 20
ML) it is oriented perpendicular to the step edges, i.e., parallel to Fe[1
00]. This excludes shape anisotropy as the main mechanism. Above a critical
thickness the uniaxial easy axis is aligned parallel to the step edges, i.
e., along Fe[010]. This step-induced uniaxial anisotropy may be due to modi
fied electronic states and to strain from the large vertical misfit at the
steps. (C) 1999 American Institute of Physics. [S0021-8979(99)64408-5].