Arrhenius-Neel thermal decay in polycrystalline thin film media

Citation
Hn. Bertram et Hj. Richter, Arrhenius-Neel thermal decay in polycrystalline thin film media, J APPL PHYS, 85(8), 1999, pp. 4991-4993
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
85
Issue
8
Year of publication
1999
Part
2A
Pages
4991 - 4993
Database
ISI
SICI code
0021-8979(19990415)85:8<4991:ATDIPT>2.0.ZU;2-#
Abstract
A simple expression for the remanent coercivity versus field time duration has been developed for polycrystalline thin film media with two-dimensional random anisotropy axis orientation. Explicit averaging of the thermally in duced reversal for random grains is shown to be well approximated by the th ermal decay of one particle with anisotropy axis at an angle of approximate to 21 degrees to the applied field. The expression has no adjustable param eters and two slightly different forms apply to noninteracting and weakly i nteracting grains. Applicability is shown to be for times greater than appr oximately 100 ns. Good agreement is shown with measurements on two series o f thin films with varying coating thickness. (C) 1999 American Institute of Physics. [S0021-8979(99)62008-4].