Transport property in narrow barrier GaAs/AlAs superlattice under hydrostatic pressure

Citation
Jq. Wu et al., Transport property in narrow barrier GaAs/AlAs superlattice under hydrostatic pressure, J APPL PHYS, 85(8), 1999, pp. 4259-4261
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
85
Issue
8
Year of publication
1999
Part
1
Pages
4259 - 4261
Database
ISI
SICI code
0021-8979(19990415)85:8<4259:TPINBG>2.0.ZU;2-#
Abstract
The current-voltage (I-V) characteristics of a doped weakly coupled GaAs/Al As superlattice (SL) with narrow barriers are measured under hydrostatic pr essure from 1 bar to 13.5 kbar at both 77 and 300 K. The experimental resul ts show that, contrary to the results in SL with wide barriers, the plateau in the I-V curve at 77 K does not shrink with increasing pressure, and bec omes wider after 10.5 kbar. It is explained by the fact that the E-Gamma 1- E-Gamma 1 resonance peak is higher than the E-Gamma 1-E-X1 resonance peak. At 300 K, however, because of the more important contribution of the nonres onant component to the current, the plateau shrinks with increasing pressur e. (C) 1999 American Institute of Physics. [S0021-8979(99)02008-3].