Photolysis at 266 nm of argon matrix isolated ozone monomer

Citation
M. Bahou et al., Photolysis at 266 nm of argon matrix isolated ozone monomer, J CHEM PHYS, 110(17), 1999, pp. 8636-8642
Citations number
27
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CHEMICAL PHYSICS
ISSN journal
00219606 → ACNP
Volume
110
Issue
17
Year of publication
1999
Pages
8636 - 8642
Database
ISI
SICI code
0021-9606(19990501)110:17<8636:PA2NOA>2.0.ZU;2-4
Abstract
The photodissociation of ozone trapped at high dilution in solid argon has been reinvestigated at different temperatures and various photon flux, comb ining irradiation at 266 nm and infrared spectroscopy. In argon, recombinat ion of O+O-2 is a major pathway and the weak decrease of ozone is due to ca ge exit of oxygen atoms which is dependent of the temperature and of the in itial photon flux. Kinetic curves are well fitted by a double exponential e xpression and a model based upon two different cage exit pathways is propos ed. (C) 1999 American Institute of Physics. [S0021-9606(99)01316-1].