Sublimation growth of silicon carbide bulk crystals: experimental and theoretical studies on defect formation and growth rate augmentation

Citation
D. Hofmann et al., Sublimation growth of silicon carbide bulk crystals: experimental and theoretical studies on defect formation and growth rate augmentation, J CRYST GR, 199, 1999, pp. 1005-1010
Citations number
10
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
199
Year of publication
1999
Part
2
Pages
1005 - 1010
Database
ISI
SICI code
0022-0248(199903)199:<1005:SGOSCB>2.0.ZU;2-V
Abstract
SiC crystals of 30-40 mm diameter were grown by physical vapor transport (P VT). The defect generation during seeding and subsequent growth was investi gated. The main origin of micropipes in crystals grown on micropipe free/re duced seeds is correlated with second-phase formation, especially with the occurrence of C inclusions. Stress and micropipe densities are found to dep end on the axial temperature gradients. Radial and axial temperature gradie nts were determined by the application of numerical modelling. Finally, the growth rate during PVT processing of SiC crystals was studied theoreticall y and experimentally. Both, a better control of vapor composition and a tim e-dependent variation of thermal boundary conditions are proposed for an au gmentation of the crystallization rate. (C) 1999 Elsevier Science B.V. All rights reserved.