On the formation of rotational spoke patterns during the Czochralski growth of bismuth silicon oxide

Citation
Jc. Rojo et Jj. Derby, On the formation of rotational spoke patterns during the Czochralski growth of bismuth silicon oxide, J CRYST GR, 199, 1999, pp. 154-160
Citations number
32
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
199
Year of publication
1999
Part
1
Pages
154 - 160
Database
ISI
SICI code
0022-0248(199903)199:<154:OTFORS>2.0.ZU;2-#
Abstract
High-resolution calculations are performed using a parallel finite element method to simulate combined rotational and buoyant flows of molten bismuth silicon oxide during Czochralski crystal growth. For the first time, spoke patterns are predicted along the surface of the melt at high crystal rotati on rates. These patterns correspond to radially aligned roll cells confined to a thin layer near the melt surface. They arise from a modified Rayleigh instability within a destabilizing thermal boundary layer caused by crysta l relation and centrifugal pumping. (C) 1999 Elsevier Science B.V. All righ ts reserved.