Nucleation and growth of faceted voids in silicon crystals

Citation
Vv. Voronkov et R. Falster, Nucleation and growth of faceted voids in silicon crystals, J CRYST GR, 199, 1999, pp. 399-403
Citations number
12
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
199
Year of publication
1999
Part
1
Pages
399 - 403
Database
ISI
SICI code
0022-0248(199903)199:<399:NAGOFV>2.0.ZU;2-3
Abstract
The growth of small faceted voids (vacancy clusters) is retarded since it r equires 2D nucleation at cluster facets. The vacancy agglomeration is remar kably affected by the resulting time lag in production of larger voids. At low starting vacancy concentration and/or high cool rate the void formation is suppressed; the vacancies go mostly to clusters. (C) 1999 Elsevier Scie nce B.V. All rights reserved.